- Patent Title: Fine metal mask, display substrate, and alignment method therefor
-
Application No.: US16306904Application Date: 2017-09-20
-
Publication No.: US11053579B2Publication Date: 2021-07-06
- Inventor: Weili Li , Xuliang Wang , Shuaiyan Gan
- Applicant: KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD.
- Applicant Address: CN Kunshan
- Assignee: KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD.
- Current Assignee: KUNSHAN GO-VISIONOX OPTO-ELECTRONICS CO., LTD.
- Current Assignee Address: CN Kunshan
- Agency: Kilpatrick Townsend & Stockton
- Priority: CN201610846761.8 20160923
- International Application: PCT/CN2017/102481 WO 20170920
- International Announcement: WO2018/054306 WO 20180329
- Main IPC: C23C14/04
- IPC: C23C14/04 ; H01L23/544 ; C23C14/24 ; H01L51/00 ; H01L51/56
Abstract:
A fine metal mask (100) comprising a pattern region (110) comprising a plurality of openings; and a plurality of alignment holes (120) located outside the pattern region (110). Also disclosed are a display substrate (200) and an alignment method for the fine metal mask (100) for evaporation.
Public/Granted literature
- US20200308687A1 FINE METAL MASK, DISPLAY SUBSTRATE, AND ALIGNMENT METHOD THEREFOR Public/Granted day:2020-10-01
Information query
IPC分类:
