Invention Grant
- Patent Title: Programmable deposition apparatus
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Application No.: US15746683Application Date: 2016-07-25
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Publication No.: US11053588B2Publication Date: 2021-07-06
- Inventor: Pieter Jan De Roij , Ernst Dullemeijer , Eduard Renier Francisca Clerkx
- Applicant: BASF Coatings GmbH
- Applicant Address: DE Münster
- Assignee: BASF Coatings GmbH
- Current Assignee: BASF Coatings GmbH
- Current Assignee Address: DE Münster
- Agency: Armstrong Teasdale LLP
- Priority: NL2015215 20150723
- International Application: PCT/NL2016/050552 WO 20160725
- International Announcement: WO2017/014639 WO 20170126
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/458 ; C23C16/54

Abstract:
A deposition apparatus including a frame and a cylindrical drum with a cylindrical surface that extends along a central axis. The drum has a first and a second end surface, which extend perpendicularly to the central axis. The drum is rotatably mounted in the frame and includes a plurality of gas zones positioned on the cylindrical surface. The included gas channels extend within the drum. At least a number of the gas zones are in gas connection with at least two channels. The deposition apparatus includes closing elements for closing off all but one of the at least two channels with which a said gas zone is in gas connection so that the type of gas supplied to the various gas zones along the drum surface is programmable.
Public/Granted literature
- US20180223430A1 PROGRAMMABLE DEPOSITION APPARATUS Public/Granted day:2018-08-09
Information query
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