Invention Grant
- Patent Title: Imprint mold and method for manufacturing the same
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Application No.: US16126396Application Date: 2018-09-10
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Publication No.: US11054740B2Publication Date: 2021-07-06
- Inventor: Sheng-Ming Huang , Sheng-Kai Lin , Chih-Chiang Chen , Hui-Ku Chang , Chia-Hsin Chung , Wei-Chi Wang , Ming-Jui Wang , Jen-Kuei Lu , Tsai-Sheng Lo , Huang-Kai Shen
- Applicant: AU OPTRONICS CORPORATION
- Applicant Address: TW Hsin-Chu
- Assignee: AU OPTRONICS CORPORATION
- Current Assignee: AU OPTRONICS CORPORATION
- Current Assignee Address: TW Hsin-Chu
- Agency: WPAT, PC
- Priority: TW106131277 20170912
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns. The imprint mold manufacturing method includes: disposing a first layer on a substrate; disposing a first hard mask layer on the first layer, wherein the first hard mask layer includes one or more first hollow area; forming a first mold pattern on the first layer by imprinting, wherein the region of the first mold pattern completely overlaps the region of the vertical projection of the first hollow area on the first layer; removing the first hard mask layer; disposing a second hard mask layer on the first layer, wherein the second hard mask layer includes one or more second hollow area, wherein the region of the vertical projection of the second hollow area on the first layer is adjacent to the first mold pattern; forming a second mold pattern on the first layer by imprinting, wherein the region of the second mold pattern completely overlaps the region of the vertical projection of the second hollow area on the first layer; and removing the second hard mask layer.
Public/Granted literature
- US20190079394A1 IMPRINT MOLD AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2019-03-14
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