Provided is a learning processor including a base characteristic acquiring section that acquires base characteristic data indicating a characteristic of a base layer serving as a base on which a film is to be deposited by a film deposition apparatus; a film characteristic acquiring section that acquires film characteristic data indicating a characteristic of the film deposited on the base layer by the film deposition apparatus; and a first learning processing section that performs learning processing of a first model that outputs predicted film characteristic data obtained by predicting a characteristic of a film to be deposited by the film deposition apparatus based on targeted base characteristic data indicating a characteristic of a base layer serving as a target for formation of the film, using learning data that includes the base characteristic data and the film characteristic data.