Invention Grant
- Patent Title: Radio frequency pulse matching method and device thereof and pulsing plasma generation system
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Application No.: US17134113Application Date: 2020-12-24
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Publication No.: US11056316B2Publication Date: 2021-07-06
- Inventor: Xiaoyang Cheng , Gang Wei , Jing Wei , Jinzhi Bai , Jing Yang
- Applicant: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Anova Law Group, PLLC
- Priority: CN201810678471.6 20180627
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46

Abstract:
A radio frequency (RF) pulse matching method includes presetting a matching threshold and initializing a pulse count value to a pulse reference value and loading pulse power to an upper electrode and a lower electrode. The upper electrode includes an upper RF power supply and a corresponding upper matching device. The lower electrode includes a lower RF power supply and a corresponding lower matching device. The method further includes collecting a pulse signal of the pulse power and calculating a matching parameter according to the pulse signal, determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value, causing the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply, and repeating processes until the upper RF power supply and the lower RF power supply are matched.
Public/Granted literature
- US20210118651A1 RADIO FREQUENCY PULSE MATCHING METHOD AND DEVICE THEREOF AND PULSING PLASMA GENERATION SYSTEM Public/Granted day:2021-04-22
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