Invention Grant
- Patent Title: Protective layer for photopolymer
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Application No.: US16634199Application Date: 2018-07-23
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Publication No.: US11059930B2Publication Date: 2021-07-13
- Inventor: Serguei Kostromine , Thomas Roelle , Wieland Hovestadt , Karl Vetterle , Therese Klobutowski
- Applicant: Covestro Deutschland AG
- Applicant Address: DE Leverkusen
- Assignee: Covestro Deutschland AG
- Current Assignee: Covestro Deutschland AG
- Current Assignee Address: DE Leverkusen
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: EP17183344 20170726
- International Application: PCT/EP2018/069888 WO 20180723
- International Announcement: WO2019/020553 WO 20190131
- Main IPC: C08F283/00
- IPC: C08F283/00 ; B29D11/00 ; B32B7/12 ; B32B27/08 ; B32B27/30 ; G03H1/00 ; C09J7/29 ; C08K5/5415 ; G03H1/02

Abstract:
The invention relates to a protective layer comprising a photopolymer layer B and an at least partly cured protective layer C, to a process for producing the layer construction according to the invention, to a kit of parts, to the use of an at least partly cured protective layer C for protection of a photopolymer layer B and to optical displays and security documents comprising the layer construction according to the invention.
Public/Granted literature
- US20210095064A1 PROTECTIVE LAYER FOR PHOTOPOLYMER Public/Granted day:2021-04-01
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