Invention Grant
- Patent Title: Capacitor and method for fabricating the same
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Application No.: US16659564Application Date: 2019-10-21
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Publication No.: US11063113B2Publication Date: 2021-07-13
- Inventor: Bin Lu , Jian Shen
- Applicant: SHENZHEN WEITONGBO TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN WEITONGBO TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN WEITONGBO TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Agency: Scully Scott Murphy & Presser
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L49/02

Abstract:
A capacitor is disclosed, including: a semiconductor substrate including opposite upper and lower surfaces; one first trench disposed in the semiconductor substrate and formed downward from the upper surface; one second trench disposed in the substrate and corresponding to the first trench, and formed upward from the lower surface; a first conductive layer disposed above the substrate and in the first trench; a first insulating layer disposed between the substrate and the first conductive layer; a second conductive layer disposed on the substrate and in the first trench, the second conductive layer being electrically connected to the substrate; a second insulating layer disposed between the second conductive layer and the first conductive layer; a third conductive layer disposed below the substrate and in the second trench; and a third insulating layer disposed between the third conductive layer and the substrate, which is electrically connected to the first conductive layer.
Public/Granted literature
- US20200052064A1 CAPACITOR AND METHOD FOR FABRICATING THE SAME Public/Granted day:2020-02-13
Information query
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