Invention Grant
- Patent Title: Array substrate and manufacturing method thereof
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Application No.: US16614565Application Date: 2019-09-16
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Publication No.: US11069632B2Publication Date: 2021-07-20
- Inventor: Chao He
- Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Hubei
- Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Current Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Hubei
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: CN201910430461.5 20190522
- International Application: PCT/CN2019/105900 WO 20190916
- International Announcement: WO2020/232920 WO 20201126
- Main IPC: H01L23/60
- IPC: H01L23/60 ; H01L27/12 ; H01L23/552

Abstract:
The present disclosure provides an array substrate. The array substrate includes a plurality of shielding layers disposed on a glass substrate and arranged at intervals; a dielectric layer spread on the glass substrate and covering the shielding layers, wherein the dielectric layer includes a plurality of dielectric patterns, the dielectric patterns include main dielectric patterns and auxiliary dielectric patterns disposed on at least one side of the main dielectric patterns; and a gate insulating layer disposed on the dielectric layer.
Information query
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