Invention Grant
- Patent Title: Semiconductor memory device and manufacturing method for same
-
Application No.: US16120405Application Date: 2018-09-03
-
Publication No.: US11075213B2Publication Date: 2021-07-27
- Inventor: Kosei Noda
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JPJP2018-052418 20180320
- Main IPC: H01L27/11551
- IPC: H01L27/11551 ; H01L27/11529 ; H01L27/1157 ; H01L27/11582 ; H01L27/11578

Abstract:
According to one embodiment, semiconductor memory device includes a first conductive layer, a plurality of second conductive layers stacked over the first conductive layer in a first direction, a memory pillar extending in the plurality of second conductive layers in the first direction, and a first layer extending from the first conductive layer through a portion of the plurality of second conductive layers in the first direction in contact with a the plurality of second conductive layers, the first layer including a first portion having a first cross section in the plane of second and third directions that are perpendicular to each other and to the first direction, and a second portion having a second cross section, different from the first cross section, in the plane of the second and third directions.
Public/Granted literature
- US20190296032A1 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD FOR SAME Public/Granted day:2019-09-26
Information query
IPC分类: