Invention Grant
- Patent Title: Mask for thin film deposition, and fabrication method thereof
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Application No.: US16122296Application Date: 2018-09-05
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Publication No.: US11075340B2Publication Date: 2021-07-27
- Inventor: Hyuneok Shin , Hongsick Park , Sangwoo Sohn , Sangwon Shin , Sanggab Kim , Shinil Choi
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-si
- Agency: Cantor Colburn LLP
- Priority: KR10-2017-0115130 20170908
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; C23F1/02 ; C23F4/00 ; H01L51/56 ; B05C21/00

Abstract:
A mask for thin film deposition includes a first mask which defines an opening, and a second mask on a surface of the first mask, and which defines a plurality of deposition holes and has a multilayer structure, in which the opening and the plurality of deposition holes communicate with each other and provide a passage for a deposition material, a size of each of the plurality of deposition holes is smaller than a size of the opening, and each of the plurality of deposition holes has a shape corresponding to a deposition pattern to be patterned on a substrate.
Public/Granted literature
- US20190081241A1 MASK FOR THIN FILM DEPOSITION, AND FABRICATION METHOD THEREOF Public/Granted day:2019-03-14
Information query
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