Invention Grant
- Patent Title: Vapor chamber
-
Application No.: US16521487Application Date: 2019-07-24
-
Publication No.: US11079183B2Publication Date: 2021-08-03
- Inventor: Hirofumi Aoki , Yoshikatsu Inagaki , Hiroshi Sakai
- Applicant: FURUKAWA ELECTRIC CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: FURUKAWA ELECTRIC CO., LTD.
- Current Assignee: FURUKAWA ELECTRIC CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Dorsey & Whitney LLP
- Priority: JPJP2017-013588 20170127,JPJP2017-018857 20170203
- Main IPC: F28D15/00
- IPC: F28D15/00 ; F28D15/04

Abstract:
A vapor chamber excellent in productivity, reduction of a number of components, and capable of preventing reduction in area of a cavity section while reducing a space of an outer periphery of the cavity section in which a working fluid is sealed is provided. An example vapor chamber has a container in which a cavity section is formed by stacked plate-shaped members, a working fluid that is sealed in the cavity section, and a wick structure accommodated in the cavity section.
Information query