Invention Grant
- Patent Title: Semiconductor inspection apparatus and semiconductor device inspection method
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Application No.: US16808639Application Date: 2020-03-04
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Publication No.: US11079336B2Publication Date: 2021-08-03
- Inventor: Ikuo Motonaga
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: White & Case LLP
- Priority: JPJP2019-167626 20190913
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G06T7/00

Abstract:
A semiconductor inspection apparatus of embodiments includes: a light source irradiating a semiconductor package, the semiconductor package including: a sealing portion having an upper surface, a lower surface, a first side surface, and a second side surface; and a first lead extending from the first side surface, the first lead having a first wide width portion and a first narrow width portion, the first wide width portion being between the first side surface and the first narrow width portion; an imaging device capturing a first image of the first lead; a first calculator calculating a first area of a first notch region located on one side of the first narrow width portion and a second area of a second notch region located on the other side of the first narrow width portion; and a second calculator calculating a ratio of the first area and the second area.
Public/Granted literature
- US20210080404A1 SEMICONDUCTOR INSPECTION APPARATUS AND SEMICONDUCTOR DEVICE INSPECTION METHOD Public/Granted day:2021-03-18
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