Invention Grant
- Patent Title: Substrate table with vacuum channels grid
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Application No.: US15821971Application Date: 2017-11-24
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Publication No.: US11081383B2Publication Date: 2021-08-03
- Inventor: Min-Cheng Wu , Chi-Hung Liao
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/683 ; H01L21/67 ; B25B11/00
Abstract:
A substrate table is provided. The substrate table includes a main body configured to support a substrate thereon. The substrate table further includes a number of vacuum channels provided in the main body and respectively formed with a vacuum opening on a surface of the main body. The vacuum channels are configured to apply a vacuum to the substrate. The vacuum channels are distributed throughout the main body and arranged in a grid pattern.
Public/Granted literature
- US20190164803A1 SUBSTRATE TABLE WITH VACUUM CHANNELS GRID Public/Granted day:2019-05-30
Information query
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