Invention Grant
- Patent Title: Anode up—cathode down silicon and germanium photodiode
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Application No.: US16533609Application Date: 2019-08-06
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Publication No.: US11081610B2Publication Date: 2021-08-03
- Inventor: Difeng Zhu , Edward Preisler
- Applicant: Newport Fab, LLC
- Applicant Address: US CA Newport Beach
- Assignee: Newport Fab, LLC
- Current Assignee: Newport Fab, LLC
- Current Assignee Address: US CA Newport Beach
- Agency: Farjami & Farjami LLP
- Main IPC: H01L31/105
- IPC: H01L31/105 ; H01L31/18 ; H01L27/144 ; H01L31/0288

Abstract:
There are disclosed various implementations of an anode over cathode germanium and silicon photodiode including an N type silicon region formed in a silicon substrate, the N type silicon region being a cathode of the photodiode. In addition, the photodiode includes a P type germanium region situated over the N type silicon region, the P type germanium region being an anode of the photodiode. An anode contact of the photodiode is situated over the P type germanium region providing the anode. In some implementations, silicided cathode contacts are formed over the N type silicon region providing the cathode. In some implementations, a P type silicon cap is formed over the P type germanium region. In those implementations, a silicided anode contact may be situated on the P type silicon cap.
Public/Granted literature
- US20200259037A1 Anode Up - Cathode Down Silicon and Germanium Photodiode Public/Granted day:2020-08-13
Information query
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