Invention Grant
- Patent Title: Protection method for through-holes of a semiconductor wafer
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Application No.: US17007566Application Date: 2020-08-31
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Publication No.: US11081615B2Publication Date: 2021-08-03
- Inventor: Alexander Frey , Benjamin Hagedorn
- Applicant: AZUR SPACE Solar Power GmbH
- Applicant Address: DE Heilbronn
- Assignee: AZUR SPACE Solar Power GmbH
- Current Assignee: AZUR SPACE Solar Power GmbH
- Current Assignee Address: DE Heilbronn
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: DE102019006093.8 20190829
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0224

Abstract:
A protection method for through-holes of a semiconductor wafer having the steps: providing a semiconductor wafer, and comprising a plurality of solar cell stacks, wherein each solar cell stack has a Ge substrate forming a bottom side of the semiconductor wafer, a Ge subcell, and at least two III-V subcells in the order mentioned, as well as at least one through-hole, extending from the top side to the bottom side of the semiconductor wafer, with a continuous side wall and a circumference that is oval in cross section; applying a photoresist layer to a top side of the semiconductor wafer and to at least one region of the side wall of the through-hole, said region adjoining the top side, and applying an organic filler material by means of a printing process to a region of the top side, said region comprising the through-hole, and into the through-hole.
Public/Granted literature
- US20210066532A1 PROTECTION METHOD FOR THROUGH-HOLES OF A SEMICONDUCTOR WAFER Public/Granted day:2021-03-04
Information query
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