Invention Grant
- Patent Title: Purification method and purification apparatus
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Application No.: US16090914Application Date: 2017-03-30
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Publication No.: US11090577B2Publication Date: 2021-08-17
- Inventor: Sachiko Kawakami , Yasushi Kitano , Kanata Abe
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Husch Blackwell LLP
- Priority: JPJP2016-077764 20160408
- International Application: PCT/IB2017/051809 WO 20170330
- International Announcement: WO2017/175096 WO 20171012
- Main IPC: B01D7/02
- IPC: B01D7/02 ; B01D7/00 ; B01D1/14 ; C07B63/00 ; C09K11/06 ; H01L51/00 ; H01L51/50 ; H01L51/56 ; H01L51/52

Abstract:
A novel sublimation purification method is provided. Moreover, a novel sublimation purification apparatus is provided. A purification method using a purification apparatus including a purification portion where a substance is purified by vaporization, a temperature adjustment means, a gas supply means, and a gas discharge means is provided. In the purification method, the inside of the purification portion is made to have a first pressure with use of the gas discharge means, a temperature gradient is generated in the purification portion with use of the temperature adjustment means such that the substance is purified, the pressure in the purification portion is then set at a second pressure with use of the gas supply means, and the purification portion is cooled with use of the temperature adjustment means. The second pressure is higher than the first pressure and the second pressure is higher than or equal to an atmospheric pressure.
Public/Granted literature
- US20190118113A1 Purification Method and Purification Apparatus Public/Granted day:2019-04-25
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