Invention Grant
- Patent Title: Wafer arrangement for gas sensor
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Application No.: US16944279Application Date: 2020-07-31
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Publication No.: US11092538B2Publication Date: 2021-08-17
- Inventor: Stefan Kolb , Alfons Dehe , Jochen Huber , Franz Jost , Horst Theuss , Wilhelm Wiedmeier , Juergen Woellenstein
- Applicant: Infineon Technologies AG , Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.
- Applicant Address: DE Neubiberg; DE Munich
- Assignee: Infineon Technologies AG,Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.
- Current Assignee: Infineon Technologies AG,Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.
- Current Assignee Address: DE Neubiberg; DE Munich
- Agency: Design IP
- Priority: DE202015002315.0 20150327
- Main IPC: G01N21/17
- IPC: G01N21/17 ; G01N29/24 ; G01N29/02 ; G01N29/30

Abstract:
A gas sensor includes a multi-wafer stack of a plurality of layers and a measurement chamber. The plurality of layers includes a first layer comprising a sensor element that has a microelectromechanical system (MEMS) membrane; and a second layer comprising an emitter element configured to emit electromagnetic radiation. The measurement chamber is interposed between the first layer and the second layer. The measurement chamber is configured to receive a measurement gas and further receive the electromagnetic radiation emitted by the emitter element as the electromagnetic radiation travels along a radiation path from a first end of the measurement chamber to a second end of the measurement chamber that is opposite to the first end.
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