Invention Grant
- Patent Title: Vacuum chamber arrangement for charged particle beam generator
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Application No.: US16796849Application Date: 2020-02-20
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Publication No.: US11094426B2Publication Date: 2021-08-17
- Inventor: Alexander Hendrik Vincent Van Veen , Willem Henk Urbanus , Marco Jan-Jaco Wieland
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: H01J37/30
- IPC: H01J37/30 ; G21K5/04 ; G21K1/02 ; H01J37/317 ; H01J37/16 ; H01J37/12

Abstract:
The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
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