Invention Grant
- Patent Title: X-ray source target
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Application No.: US15442132Application Date: 2017-02-24
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Publication No.: US11094497B2Publication Date: 2021-08-17
- Inventor: Yong Liang , Vance Scott Robinson , Uwe Wiedmann
- Applicant: General Electric Company
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Main IPC: H01J35/00
- IPC: H01J35/00 ; H01J35/10 ; H01J35/12

Abstract:
In one embodiment, an X-ray source includes a source target configured to generate X-rays when impacted by an electron beam. The source target includes one or more thermally conductive layers; and one or more X-ray generating layers interleaved with the thermally conductive layers, wherein at least one X-ray generating layer comprises regions of X-ray generating material separated by thermally conductive material within the respective X-ray generating layer.
Public/Granted literature
- US20180247786A1 X-RAY SOURCE TARGET Public/Granted day:2018-08-30
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