Invention Grant
- Patent Title: Processing liquid supplying apparatus, substrate processing apparatus and processing liquid supplying method
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Application No.: US16168949Application Date: 2018-10-24
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Publication No.: US11094564B2Publication Date: 2021-08-17
- Inventor: Shota Iwahata , Ayumi Higuchi , Eri Fujita , Yoshiyuki Fujitani , Masako Mano , Yusuke Takematsu , Yosuke Okuya
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JPJP2017-207343 20171026
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/14 ; C25D17/02

Abstract:
A processing liquid supplying apparatus supplies a processing liquid to a processing unit which processes a substrate. The processing liquid supplying apparatus includes a supply pipe to which a processing liquid inside a processing liquid tank that stores the processing liquid is fed and which supplies the processing liquid, which is fed from the processing liquid tank, to the processing unit, a return pipe which is branched and connected to the supply pipe to return a processing liquid inside the supply pipe to the processing liquid tank, a first heating unit which heats a processing liquid inside an upstream-side portion to be heated that is set in the supply pipe upstream from a branched position to which the return pipe is connected, a second heating unit which heats a processing liquid inside a downstream-side portion to be heated that is set in the supply pipe downstream from the branched position, a cooling unit which cools a processing liquid inside a portion to be cooled that is set in the return pipe, and a first filter which is interposed in the supply pipe upstream from the upstream-side portion to be heated and removes particles in a processing liquid.
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