Invention Grant
- Patent Title: Substrate treating method, substrate treating liquid and substrate treating apparatus
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Application No.: US16100259Application Date: 2018-08-10
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Publication No.: US11094565B2Publication Date: 2021-08-17
- Inventor: Yuta Sasaki , Yosuke Hanawa
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JPJP2017-183415 20170925
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/10 ; H01L21/02 ; H01L21/687 ; C11D7/24

Abstract:
Disclosed is a substrate treating method of performing drying treatment on a pattern-formed surface of a substrate, the substrate treating method comprising: a supplying step of supplying a substrate treating liquid containing a plastic crystalline material in a molten state to the pattern-formed surface of the substrate; a plastic crystalline layer forming step of bringing, on the pattern-formed surface, the plastic crystalline material into a state of a plastic crystal so as to form a plastic crystalline layer; and a removing step of changing the plastic crystalline material in the state of the plastic crystal into a gas state without an intermediate phase of liquid so as to remove the plastic crystalline material from the pattern-formed surface.
Public/Granted literature
- US20190096704A1 SUBSTRATE TREATING METHOD, SUBSTRATE TREATING LIQUID AND SUBSTRATE TREATING APPARATUS Public/Granted day:2019-03-28
Information query
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