Invention Grant
- Patent Title: Cleaning solution production systems and methods, and plasma reaction tanks
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Application No.: US16505488Application Date: 2019-07-08
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Publication No.: US11107705B2Publication Date: 2021-08-31
- Inventor: Beom Jin Yoo , Min Hyoung Kim , Sang Ki Nam , Won Hyuk Jang , Kyu Hee Han , Young Do Kim , Jeong Min Bang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Volentine, Whitt & Francos, PLLC
- Priority: KR10-2018-0088438 20180730
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01J37/32 ; H01L21/02
Abstract:
A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.
Public/Granted literature
- US20200035515A1 CLEANING SOLUTION PRODUCTION SYSTEMS AND METHODS, AND PLASMA REACTION TANKS Public/Granted day:2020-01-30
Information query
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