Invention Grant
- Patent Title: System and method of pattern-making for mass customized production of apparels
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Application No.: US16482234Application Date: 2018-06-01
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Publication No.: US11109627B2Publication Date: 2021-09-07
- Inventor: Balan Gopala Krishnan , Kishan Singh Rajawat
- Applicant: ESHAKTI.COM PVT LTD
- Applicant Address: IN Chennai
- Assignee: ESHAKTI.COM PVT LTD
- Current Assignee: ESHAKTI.COM PVT LTD
- Current Assignee Address: IN Chennai
- Agency: Innovation Capital Law Group
- Agent Vic Lin
- Priority: IN201741019371 20170602
- International Application: PCT/IN2018/050355 WO 20180601
- International Announcement: WO2018/220652 WO 20181206
- Main IPC: A41H3/00
- IPC: A41H3/00 ; G06Q30/06 ; G06Q50/04 ; A41D1/00

Abstract:
The present invention relates to system and method of pattern-making for mass customized production of apparels. More particularly, the invention relates to height and size customizations which enable customers to get garments fitted to their body measurements. Further, the invention relates to style customization that enables customers to fashion the garment to their style preferences. The system [100] of pattern-making for mass customized production of apparels comprises a computing module [101], an internet [102], user device [106], a design database [103] comprising a product pattern repository [103a] and an order pattern repository [103b], one or more servers [104], a processor [105], a customization input module [107], a user style recommendation module [108] and a comparison module [109]. Advantageously, the present invention achieves unit manufacturing of customized individual consumer orders obtained from an online store, a physical store or through other channels.
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