Invention Grant
- Patent Title: Block copolymer containing photo-sensitive moiety
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Application No.: US16340281Application Date: 2017-10-17
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Publication No.: US11111331B2Publication Date: 2021-09-07
- Inventor: No Jin Park , Jin Kon Kim , Chung Ryong Choi , Sung Soo Yoon
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: KR10-2016-0135870 20161019
- International Application: PCT/KR2017/011442 WO 20171017
- International Announcement: WO2018/074806 WO 20180426
- Main IPC: C08F299/02
- IPC: C08F299/02 ; C08F212/08 ; C08F220/18 ; C08F226/10 ; C08J5/22

Abstract:
The present application may provide a block copolymer and a use thereof. The present application may provide a block copolymer and a use thereof. The block copolymer of the present application may have excellent self-assembly properties or phase separation characteristics and simultaneously have characteristics capable of changing the self-assembly structure formed once, or provide a block copolymer capable of forming a pattern of phase separation structures in a polymer membrane.
Public/Granted literature
- US20200040122A1 Block Copolymer Containing Photo-sensitive Moiety Public/Granted day:2020-02-06
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