Invention Grant
- Patent Title: PVD vacuum plating process for aluminum alloy surface
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Application No.: US16724742Application Date: 2019-12-23
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Publication No.: US11111575B2Publication Date: 2021-09-07
- Inventor: Zhongle Yin , Wenqiang Zhao
- Applicant: Foshan Nanhai Jingdingtai Intelligent Technology Co., Ltd
- Applicant Address: CN Foshan
- Assignee: Foshan Nanhai Jingdingtai Intelligent Technology Co., Ltd
- Current Assignee: Foshan Nanhai Jingdingtai Intelligent Technology Co., Ltd
- Current Assignee Address: CN Foshan
- Agency: Wood Herron & Evans LLP
- Priority: CN201910077064.4 20190127
- Main IPC: C23C14/34
- IPC: C23C14/34 ; C23C14/06 ; C23C14/10

Abstract:
A PVD vacuum plating process for an aluminum alloy surface is provided. The process includes forming a bottom layer: bombarding with an arc power supply, with a bias voltage being controlled at 200-300 V, and the time being controlled at 3-5 minutes; forming an intermediate multi-layer: conducting multilayer transition with an oxide and a nitride, with the number of layers being controlled at 8-10, the time for an individual layer being controlled at 10-20 minutes, and a target current being controlled at 10-20 A. The process also includes forming a transitional engagement layer: conducting mixed sputtering of a transition layer and a color layer for the time of 15-25 minutes; forming the color layer: controlling the time for the color layer at 20-30 minutes; and forming a protective layer: using a high-frequency and large-energy power supply with the time controlled at 40-50 minutes, the process thereby eliminating water plating steps.
Public/Granted literature
- US20200240003A1 PVD VACUUM PLATING PROCESS FOR ALUMINUM ALLOY SURFACE Public/Granted day:2020-07-30
Information query
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