Invention Grant
- Patent Title: Method for producing nanostructured layers
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Application No.: US15578809Application Date: 2016-04-27
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Publication No.: US11111576B2Publication Date: 2021-09-07
- Inventor: Aiko Buenting , Sven Uhlenbruck
- Applicant: Forschungszentrum Juelich GmbH
- Applicant Address: DE Juelich
- Assignee: Forschungszentrum Juelich GmbH
- Current Assignee: Forschungszentrum Juelich GmbH
- Current Assignee Address: DE Juelich
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: DE102015007291.6 20150610
- International Application: PCT/DE2016/000176 WO 20160427
- International Announcement: WO2016/198033 WO 20161215
- Main IPC: H01M4/82
- IPC: H01M4/82 ; H01M6/00 ; H01M4/13 ; H01M4/58 ; C23C14/34 ; C23C14/35 ; H01M4/04 ; H01M4/1391 ; B82Y30/00 ; B82Y40/00 ; H01M4/131 ; C23C14/06 ; H01M4/136 ; H01M4/1397 ; H01M4/525

Abstract:
According to a method for producing a nanostructured electrode for an electrochemical cell, in which active material is applied to an electrically conductive substrate, the active material is deposited on the electrically conductive substrate by magnetron sputtering in one process step, a ceramic target comprising an electrode material having an additional carbon proportion between 0.1 and 25% by weight is used, the substrate being kept at temperatures between 400° C. and 1200° C. during the deposition, in such a way that a fibrous porous network is formed.
Public/Granted literature
- US20180163293A1 METHOD FOR PRODUCING NANOSTRUCTURED LAYERS Public/Granted day:2018-06-14
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