Invention Grant
- Patent Title: Substrate carrier system utilizing electrostatic chucking to accommodate substrate size heterogeneity
-
Application No.: US15827845Application Date: 2017-11-30
-
Publication No.: US11111583B2Publication Date: 2021-09-07
- Inventor: Sriskantharajah Thirunavukarasu , Karthik Elumalai , Jen Sern Lew , Mingwei Zhu
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: C23C16/458
- IPC: C23C16/458 ; H01L21/683 ; H01L21/687 ; C23C16/30

Abstract:
Embodiments of improved substrate carriers are provided herein. In some embodiments, a substrate carrier, includes: a multi-layered disk having upper and lower layers formed of a continuous material and an electrostatic electrode structure disposed therebetween, wherein the multi-layered disk is dimensioned and arranged so as to have a nominal dimension which exceeds a nominal dimension of a standard substrate size used in the manufacture of light emitting diode devices, and wherein the multi-layered disk is formed symmetrically about a central axis and defines a substantially planar upper surface.
Public/Granted literature
- US20180112310A1 SUBSTRATE CARRIER SYSTEM UTILIZING ELECTROSTATIC CHUCKING TO ACCOMMODATE SUBSTRATE SIZE HETEROGENEITY Public/Granted day:2018-04-26
Information query
IPC分类: