Invention Grant
- Patent Title: Single crystal growth method which includes covering a part of a surface of a raw material for sublimation with a metal carbide powder
-
Application No.: US16559875Application Date: 2019-09-04
-
Publication No.: US11111599B2Publication Date: 2021-09-07
- Inventor: Yohei Fujikawa
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2018-167063 20180906
- Main IPC: C30B23/06
- IPC: C30B23/06 ; C30B29/60 ; C30B29/36 ; C30B23/00

Abstract:
The present invention provides a single crystal growth method capable of suppressing the recrystallization of the raw material gas subjected to sublimation on the surface of the raw material, and suppressing the generation of different polytypes in the crystal growing single crystal. The single crystal growth method is carried out in a crucible comprising an inner bottom for providing a raw material and a crystal mounting part facing the inner bottom. The method comprises in the following order: providing the raw material in the inner bottom; covering at least a part of a surface of the raw material with a metal carbide powder in a plan view from the crystal mounting part; and growing a single crystal disposed in the crystal mounting part by sublimating the raw material by heating.
Public/Granted literature
- US20200080229A1 SINGLE CRYSTAL GROWTH METHOD Public/Granted day:2020-03-12
Information query
IPC分类: