Invention Grant
- Patent Title: Rare earth thin film magnet and production method thereof
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Application No.: US16077961Application Date: 2017-02-28
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Publication No.: US11114225B2Publication Date: 2021-09-07
- Inventor: Masaki Nakano , Hirotoshi Fukunaga , Takeshi Yanai , Hironobu Sawatari
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JPJP2016-043193 20160307
- International Application: PCT/JP2017/007635 WO 20170228
- International Announcement: WO2017/154653 WO 20170914
- Main IPC: H01F1/057
- IPC: H01F1/057 ; H01F10/14 ; H01F41/14

Abstract:
A rare-earth thin film magnet is provided which includes Nd, Fe and B as essential components, characterized by including a Si substrate having an oxide film present on a surface thereof, a Nd base film formed as a first layer over the Si substrate, and a Nd—Fe—B film formed as a second layer on the first layer. The rare earth thin film magnet and a production process therefor provides a rare earth thin film magnet suffering neither film separation nor substrate breakage and having satisfactory magnetic properties even when the second layer has composition in the range of 0.120 ≤Nd/(Nd+Fe)
Information query
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