Invention Grant
- Patent Title: Substrate treating apparatus
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Application No.: US15654035Application Date: 2017-07-19
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Publication No.: US11114316B2Publication Date: 2021-09-07
- Inventor: Kota Kabune , Masahito Kashiyama , Yasuo Takahashi , Koji Nishiyama , Chiho Harayama
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Ostrolenk Faber LLP
- Priority: JPJP2016-145503 20160725,JPJP2016-145504 20160725,JPJP2016-145505 20160725
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/302 ; G03D3/06 ; G03F7/16 ; G03F7/30 ; G03F7/32

Abstract:
Disclosed is a substrate treating apparatus that treats a substrate with processing liquids. The apparatus includes a substrate holder, an exterior cup, and an interior cup. The interior cup includes an interior cup body, and an interior cup outlet. The exterior cup includes an exterior cup body, an exterior bottom cup, a first drain outlet, a first exhaust port, a second drain outlet, a second exhaust port, and a separation partition. The apparatus further includes an annular member movable upwardly/downwardly, and a drive unit that causes the annular member to move to shift the interior cup body between a collecting position and a retracting position.
Public/Granted literature
- US20180025921A1 SUBSTRATE TREATING APPARATUS Public/Granted day:2018-01-25
Information query
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