Invention Grant
- Patent Title: MEMS microphone and method of manufacturing the same
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Application No.: US16850103Application Date: 2020-04-16
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Publication No.: US11115756B2Publication Date: 2021-09-07
- Inventor: Hyeok In Kwon , Jong Won Sun
- Applicant: DB HITEK CO., LTD.
- Applicant Address: KR Seoul
- Assignee: DB HITEK CO., LTD.
- Current Assignee: DB HITEK CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: Patterson Thuente Pedersen, P.A.
- Priority: KR10-2019-0044268 20190416
- Main IPC: H04R19/00
- IPC: H04R19/00 ; H04R19/04 ; B81B7/00 ; B81C1/00 ; H04R31/00

Abstract:
A MEMS microphone includes a first dummy pad elevating a circumferential portion of an intermediate insulation layer adjacent to a second pad electrode, a second dummy pad elevating a first circumferential portion of an upper insulation layer adjacent to the second pad electrode, and a third dummy pad elevating a second circumferential portion of the upper insulation layer adjacent to the first pad electrode. Thus the first circumferential portion of the upper insulation layer is elevated relative to an upper surface of the second pad electrode, and the second circumferential portion of the upper insulation layer is elevated relative to an upper surface of the first pad electrode.
Public/Granted literature
- US20200336842A1 MEMS MICROPHONE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2020-10-22
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