Invention Grant
- Patent Title: Method of operating a semiconductor device having a desaturation channel structure
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Application No.: US16918141Application Date: 2020-07-01
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Publication No.: US11121242B2Publication Date: 2021-09-14
- Inventor: Johannes Laven , Hans-Joachim Schulze
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/66 ; H03K17/041 ; H01L29/10 ; H03K3/012 ; H03K17/60 ; H01L21/225 ; H01L21/266 ; H01L21/28 ; H01L27/088 ; H01L29/06 ; H01L29/423 ; H03K17/567

Abstract:
A method is provided for operating a semiconductor device which includes an IGBT having a desaturation semiconductor structure connected to a first electrode terminal and a gate electrode terminal for controlling a desaturation channel. The method includes: applying a first gate voltage to the gate electrode terminal so that current flows through the IGBT between the first electrode terminal and a second electrode terminal and current flow through the desaturation channel is substantially blocked; applying a different second gate voltage to the gate electrode terminal so that current flows through the IGBT between the first and second electrode terminals and charge carriers flow as a desaturating current through the desaturation channel to the first electrode terminal; and applying a different third gate voltage to the gate electrode terminal so that current flow through the IGBT between the first and second electrode terminals is substantially blocked.
Public/Granted literature
- US20200335613A1 Method of Operating a Semiconductor Device Having a Desaturation Channel Structure Public/Granted day:2020-10-22
Information query
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