- Patent Title: Quantum dot material, preparation method, and semiconductor device
-
Application No.: US15761670Application Date: 2017-04-14
-
Publication No.: US11121338B2Publication Date: 2021-09-14
- Inventor: Yixing Yang , Zheng Liu , Lei Qian
- Applicant: TCL TECHNOLOGY GROUP CORPORATION
- Applicant Address: CN Huizhou
- Assignee: TCL TECHNOLOGY GROUP CORPORATION
- Current Assignee: TCL TECHNOLOGY GROUP CORPORATION
- Current Assignee Address: CN Huizhou
- Agency: Anova Law Group, PLLC
- Priority: CN201611262014.6 20161230
- International Application: PCT/CN2017/080619 WO 20170414
- International Announcement: WO2018/120515 WO 20180705
- Main IPC: H01L51/50
- IPC: H01L51/50 ; C09K11/56 ; B82Y20/00 ; B82Y40/00 ; C09K11/88 ; B82Y30/00 ; H01L51/00 ; C23C28/00 ; H01L51/52

Abstract:
The present invention provides a QD material, a preparation method, and a semiconductor device. The QD material includes at least one QD structural unit arranged sequentially along a radial direction of the QD material. Each QD structural unit has a gradient alloy composition structure with a changing energy level width along the radial direction or a homogeneous alloy composition structure with a constant energy level width along the radial direction. The disclosed QD material not only achieves higher light-emission efficiency of QD material, but also meets the comprehensive requirements of semiconductor devices and the corresponding display technologies on QD materials. Therefore, the disclosed QD material is a desired QD light-emitting material suitable for semiconductor devices and display technologies.
Public/Granted literature
- US20190006607A1 QUANTUM DOT MATERIAL, PREPARATION METHOD, AND SEMICONDUCTOR DEVICE Public/Granted day:2019-01-03
Information query
IPC分类: