- Patent Title: Wafer transport container interior atmosphere measurement device, wafer transport container, wafer transport container interior cleaning device, and wafer transport container interior cleaning method
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Application No.: US15836132Application Date: 2017-12-08
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Publication No.: US11135623B2Publication Date: 2021-10-05
- Inventor: Mutsuo Sasaki , Tatsuhiro Kotsugai
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2016-241489 20161213
- Main IPC: B65D85/30
- IPC: B65D85/30 ; B08B5/00 ; H01L21/68 ; H01L21/673 ; H01L21/304 ; H01L21/67 ; H01L21/677

Abstract:
A wafer transport container interior atmosphere measurement device is arranged in wafer transport container. The device detects an atmosphere in the wafer transport container and communicates the atmosphere. The device includes a detector, a transmitter, and a power source. The detector detects the atmosphere in the wafer transport container. The transmitter wirelessly transmits a first information including a detection result by the detector to an external receiver. The power source supplies electric power to the detector and the transmitter.
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