Invention Grant
- Patent Title: Processing apparatus for processing wafer
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Application No.: US16126520Application Date: 2018-09-10
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Publication No.: US11135700B2Publication Date: 2021-10-05
- Inventor: Koichi Shigematsu
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer, Burns & Crain, Ltd.
- Priority: JPJP2017-175971 20170913
- Main IPC: B24B41/00
- IPC: B24B41/00 ; B24B49/12 ; B24B7/22 ; H01L21/304 ; H01L21/66 ; H01L21/67 ; H04N5/33 ; H04N7/18

Abstract:
A processing apparatus includes a processing unit grinding or polishing the reverse side, which is exposed upwardly, of a wafer, an infrared camera unit capturing an image of the wafer from the reverse side thereof and acquiring an image including the face side of the wafer, an information register having information on a pattern of structural objects which a wafer to be processed is to have on the face side, registered therein, and a determining unit determining that the wafer to be determined is a wafer to be processed if the pattern of structural objects which a wafer to be processed is to have on the face side is found on the wafer to be determined before being processed by the processing unit.
Public/Granted literature
- US20190076986A1 PROCESSING APPARATUS FOR PROCESSING WAFER Public/Granted day:2019-03-14
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