Invention Grant
- Patent Title: Patterning a nanofiber forest
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Application No.: US16589269Application Date: 2019-10-01
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Publication No.: US11135827B2Publication Date: 2021-10-05
- Inventor: Chi Huynh
- Applicant: Lintec of America, Inc.
- Applicant Address: US TX Richardson
- Assignee: Lintec of America, Inc.
- Current Assignee: Lintec of America, Inc.
- Current Assignee Address: US TX Richardson
- Agency: Greenblum & Bernstein, P.L.C.
- Main IPC: B32B38/10
- IPC: B32B38/10 ; B32B38/00 ; B32B7/12 ; B32B37/00 ; B32B37/12 ; C01B32/168

Abstract:
A nanofiber forest that includes a pattern or shape can be transferred to a substrate. The nanofiber forest can be configured to have any perimeter and/or internal shape or pattern using a stencil technique and/or using an engraving technique. This pattern can be transferred as a “negative image” of a corresponding pattern in a stencil or as a “positive image” by engraving the pattern directly into the nanofiber forest. For either type of pattern formation, the patterned nanofiber forest is transferred by applying a substrate to the pattern or to a nanofiber forest covered by a patterned stencil. Pressure is then applied causing the exposed surface of the nanofiber forest or pattern of nanofiber forest to adhere to the substrate.
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