Invention Grant
- Patent Title: Substrate support, lithographic apparatus, substrate inspection apparatus, device manufacturing method
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Application No.: US17269909Application Date: 2019-07-16
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Publication No.: US11156924B2Publication Date: 2021-10-26
- Inventor: Johannes Petrus Martinus Bernardus Vermeulen , Luc Leonardus Adrianus Martinus Meulendijks , Antonius Franciscus Johannes De Groot , Johannes Adrianus Cornelis Maria Pijnenburg
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18190585 20180823
- International Application: PCT/EP2019/069153 WO 20190716
- International Announcement: WO2020/038661 WO 20200227
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.
Public/Granted literature
- US20210263431A1 SUBSTRATE SUPPORT, LITHOGRAPHIC APPARATUS, SUBSTRATE INSPECTION APPARATUS, DEVICE MANUFACTURING METHOD Public/Granted day:2021-08-26
Information query
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