- Patent Title: Evaluating quality of a product such as a semiconductor substrate
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Application No.: US16348928Application Date: 2017-02-17
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Publication No.: US11157797B2Publication Date: 2021-10-26
- Inventor: Tanichi Ando , Hiroshi Sugahara
- Applicant: OMRON Corporation
- Applicant Address: JP Kyoto
- Assignee: OMRON Corporation
- Current Assignee: OMRON Corporation
- Current Assignee Address: JP Kyoto
- Agency: Metrolex IP Law Group, PLLC
- International Application: PCT/IB2017/000125 WO 20170217
- International Announcement: WO2018/150210 WO 20180823
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06N3/04 ; G01N21/95 ; G06N3/08 ; G06T7/00 ; H01L21/67

Abstract:
An evaluation device may include: a receiving unit that receives an image of the semiconductor substrate, the image captured by an imaging device provided on the semiconductor substrate manufacturing apparatus; a determination unit that determines, using a neural network, at least one value representative of a probability of a machine learning device outputting an erroneous output for the image, the machine learning device configured to: (i) receive the image of the semiconductor substrate, (ii) perform computation using the received image, and (iii) output information indicating the quality of the semiconductor substrate based on a result of the computation; and an output unit that outputs an output based on the at least one value representative of the probability. The neural network has been trained using: images of manufactured semiconductor substrates; and information indicating, for each one of the images, a level of erroneousness for an output from the machine learning device.
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