Invention Grant
- Patent Title: TFT driving backplane
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Application No.: US16637796Application Date: 2019-01-24
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Publication No.: US11177298B2Publication Date: 2021-11-16
- Inventor: Jiaxiang Zhao , Wenjin Cheng , Keran Jia
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hubei
- Agency: The Roy Gross Law Firm, LLC
- Agent Roy Gross
- Priority: CN201811524346.6 20181213
- International Application: PCT/CN2019/072890 WO 20190124
- International Announcement: WO2020/118876 WO 20200618
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L27/12 ; H01L27/32

Abstract:
Provided is a TFT driving backplane including, in top-to-bottom order, a sub-data line, a first insulating layer, a top capacitor plate, a second insulating layer and a bottom capacitor plate. In one side of the top capacitor plate is provided a notch filled upward by the first insulating layer provided with a first via extending vertically downward to the bottom capacitor plate. By moving the position where the sub-data line and the bottom capacitor plate are connected away from the top capacitor plate, holing is not required to be performed at the center of the capacitor and two-step opening alignment is avoided. Consequently, the requirement for alignment precision in photolithography is less critical, and the deviation due to two-step opening alignment is prevented. Meanwhile, by designing the margin and the one-way deviation, the short circuit in the capacitor can be avoided, and the effective capacitive area can be increased.
Public/Granted literature
- US20200286932A1 TFT DRIVING BACKPLANE Public/Granted day:2020-09-10
Information query
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