Invention Grant
- Patent Title: RRAM device with spacer for electrode isolation
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Application No.: US16408865Application Date: 2019-05-10
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Publication No.: US11177319B2Publication Date: 2021-11-16
- Inventor: Hiroyuki Miyazoe , Iqbal Rashid Saraf , Dexin Kong , Takashi Ando
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Randall Bluestone
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
Embodiments of the present invention are directed to forming a Resistive Random Access Memory (RRAM) device with a spacer for electrode isolation. In a non-limiting embodiment of the invention, a memory stack including a top electrode, a bottom electrode, and a dielectric layer between the top electrode and the bottom electrode is formed. A portion of the memory stack is removed to expose a sidewall of the top electrode and a spacer is formed on the sidewall of the top electrode. The spacer is positioned to encapsulate the top electrode, physically preventing a short between the top electrode and the bottom electrode.
Information query
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