Invention Grant
- Patent Title: Semiconductor device and method for manufacturing same
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Application No.: US16813177Application Date: 2020-03-09
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Publication No.: US11177381B2Publication Date: 2021-11-16
- Inventor: Hiroaki Katou , Kenya Kobayashi , Tatsuya Nishiwaki
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: Allen & Overy, LLP
- Priority: JPJP2019-166906 20190913
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/78 ; H01L29/423

Abstract:
A semiconductor device includes a semiconductor part, a first electrode, a plurality of control electrodes and a second electrode. The semiconductor part has a plurality of first trenches and a second trench. The plurality of first trenches are spaced from each other and arranged around the second trench. The first electrode is provided above the semiconductor part. The first electrode is provided over the plurality of first trenches and the second trench. The control electrodes are provided in the first trenches, respectively. The control electrodes each are electrically isolated from the semiconductor part by a first insulating film. The second electrode is provided in the second trench. The second electrode is electrically isolated from the semiconductor part by a second insulating film and electrically connected to the first electrode.
Public/Granted literature
- US20210083103A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2021-03-18
Information query
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