Invention Grant
- Patent Title: Element chip manufacturing method
-
Application No.: US16809755Application Date: 2020-03-05
-
Publication No.: US11189480B2Publication Date: 2021-11-30
- Inventor: Shogo Okita , Atsushi Harikai , Akihiro Itou
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Pearne & Gordon LLP
- Priority: JPJP2019-047429 20190314
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/02 ; H01L21/78 ; H01L21/463 ; H01L21/82

Abstract:
An element chip manufacturing method including: a preparing step of preparing a substrate including a plurality of element regions and a dicing region defining the element regions, the substrate having a first surface and a second surface opposite the first surface; a laser scribing step of applying a laser beam to the dicing region from a side of the first surface, to form a groove corresponding to the dicing region and being shallower than a thickness of the substrate; a cleaning step of exposing the first surface of the substrate to a first plasma, to remove debris on the groove; and a dicing step of exposing the substrate at a bottom of the groove to a second plasma after the cleaning step, to dice the substrate into element chips including the element regions. The first plasma is generated from a process gas containing a carbon oxide gas.
Public/Granted literature
- US20200294791A1 ELEMENT CHIP MANUFACTURING METHOD Public/Granted day:2020-09-17
Information query
IPC分类: