Invention Grant
- Patent Title: Double-frequency antenna structure with high isolation
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Application No.: US16815166Application Date: 2020-03-11
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Publication No.: US11189916B2Publication Date: 2021-11-30
- Inventor: Yu-Chih Chueh , Mao-Chang Chuang
- Applicant: NANNING FUGUI PRECISION INDUSTRIAL CO., LTD.
- Applicant Address: CN Nanning
- Assignee: NANNING FUGUI PRECISION INDUSTRIAL CO., LTD.
- Current Assignee: NANNING FUGUI PRECISION INDUSTRIAL CO., LTD.
- Current Assignee Address: CN Nanning
- Agency: ScienBiziP, P.C.
- Main IPC: H01Q1/38
- IPC: H01Q1/38 ; H01Q1/48 ; H01Q21/06 ; H01Q21/28

Abstract:
A double-frequency antenna structure with a high degree of electrical isolation between long distance and short distance antennas includes a dielectric substrate having at least two corners and a center area. A first set of antenna arrays is positioned at the corners. A second set of antenna arrays is positioned at the center area. At least one first folded isolation plate is mounted on the dielectric substrate, and positioned between the first set of antenna arrays and the second set of antenna arrays. At least one second folded isolation plate each is mounted on one first folded isolation plate.
Public/Granted literature
- US20200212555A1 DOUBLE-FREQUENCY ANTENNA STRUCTURE WITH HIGH ISOLATION Public/Granted day:2020-07-02
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