Invention Grant
- Patent Title: Cleaning device, plating device including the same, and cleaning method
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Application No.: US16590769Application Date: 2019-10-02
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Publication No.: US11192151B2Publication Date: 2021-12-07
- Inventor: Masaki Tomita , Shao Hua Chang
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: BakerHostetler
- Priority: JPJP2018-190133 20181005
- Main IPC: B08B3/02
- IPC: B08B3/02 ; B08B3/10 ; C25D21/12 ; C25D17/06

Abstract:
There is provided a cleaning device that cleans a substrate holder including a first holding member and a second holding member having an opening for exposing a substrate. This cleaning device includes a cleaning bath configured to house the substrate holder, an actuator configured to separate the second holding member from the first holding member, and a cleaning nozzle configured to discharge a cleaning liquid to the substrate holder housed in the cleaning bath. The cleaning nozzle is configured to pass through the opening of the second holding member.
Information query
IPC分类: