Invention Grant
- Patent Title: Texture structure manufacturing method
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Application No.: US16498456Application Date: 2018-03-20
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Publication No.: US11195963B2Publication Date: 2021-12-07
- Inventor: Tomo Tanaka , Shunsuke Ohkouchi
- Applicant: NEC CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NEC CORPORATION
- Current Assignee: NEC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2017-069827 20170331
- International Application: PCT/JP2018/011028 WO 20180320
- International Announcement: WO2018/180765 WO 20181004
- Main IPC: H01L31/0236
- IPC: H01L31/0236 ; H01L27/146 ; H01L33/00 ; H01L33/22

Abstract:
Provided is a texture structure manufacturing method with which a texture structure can be obtained simply. The texture structure manufacturing method comprises: growing a layer including a randomly distributed nanostructure on a major surface of a base material; forming a light-scattering body having the nanostructure embedded therein; and exposing a surface of the light-scattering body by removing a part or all of the base material and the layer including the nanostructure.
Public/Granted literature
- US20210193851A1 TEXTURE STRUCTURE MANUFACTURING METHOD Public/Granted day:2021-06-24
Information query
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