Invention Grant
- Patent Title: Electronic device and method for fabricating the same
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Application No.: US16195483Application Date: 2018-11-19
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Publication No.: US11195988B2Publication Date: 2021-12-07
- Inventor: Guk-Cheon Kim , Yang-Kon Kim , Seung Mo Noh , Won-Joon Choi
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-Si
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Icheon-Si
- Agency: Perkins Coie LLP
- Priority: KR10-2015-0104875 20150724
- Main IPC: G11C11/16
- IPC: G11C11/16 ; H01L43/02 ; G06F13/16 ; H01L43/08 ; H01L43/10 ; G06F13/42 ; G11C11/15 ; H01L43/12 ; H01L27/22 ; G06F12/0802 ; G06F3/06 ; G06F12/0868 ; H01F10/32 ; H01F41/34

Abstract:
This technology provides a method for fabricating an electronic device. A method for fabricating an electronic device including a variable resistance element, which includes a free layer having a variable magnetization direction; a pinned layer having a first non-variable magnetization direction, and including first ferromagnetic materials and a first spacer layer interposed between adjacent two first ferromagnetic materials among the first ferromagnetic materials; a tunnel barrier layer interposed between the free layer and the pinned layer; a magnetic correction layer having a second magnetization direction which is anti-parallel to the first magnetization direction; and a third spacer layer interposed between the magnetic correction layer and the pinned layer, and providing an anti-ferromagnetic exchange coupling between the magnetic correction layer and the pinned layer.
Public/Granted literature
- US20190189907A1 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2019-06-20
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