Invention Grant
- Patent Title: Method for producing vapor deposition mask, method for producing organic semiconductor element, and method for producing organic EL display
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Application No.: US16337058Application Date: 2017-10-04
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Publication No.: US11196002B2Publication Date: 2021-12-07
- Inventor: Hiroshi Kawasaki , Katsunari Obata
- Applicant: Dai Nippon Printing Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JPJP2016-198191 20161006
- International Application: PCT/JP2017/036161 WO 20171004
- International Announcement: WO2018/066611 WO 20180412
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/56

Abstract:
In a method for producing a vapor deposition mask including a resin mask 20 including resin mask openings 25 corresponding to a pattern to be produced by vapor deposition, and a metal mask 10 including a metal mask opening 15, the metal mask being stacked on one surface of the resin mask, when the plurality of resin mask openings 25 are formed, as to any one resin mask opening 25a of the plurality of resin mask openings 25, the resin mask opening 25 is formed such that in a thicknesswise cross section of the resin mask, an acute angle (θ1) formed by one inner wall surface forming the one resin mask opening and the other surface of the resin mask is different from an acute angle (θ2) formed by the other inner wall surface forming the one resin mask opening and the other surface of the resin mask.
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Information query
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