Invention Grant
- Patent Title: High efficiency vapor transport sublimation source using baffles coated with source material
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Application No.: US16659803Application Date: 2019-10-22
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Publication No.: US11196030B2Publication Date: 2021-12-07
- Inventor: William E. Quinn , Gregory McGraw
- Applicant: Universal Display Corporation
- Applicant Address: US NJ Ewing
- Assignee: Universal Display Corporation
- Current Assignee: Universal Display Corporation
- Current Assignee Address: US NJ Ewing
- Agency: Butzel Long
- Main IPC: H01L51/56
- IPC: H01L51/56 ; H01L51/00 ; C23C16/455 ; C23C16/448
Abstract:
A source of material for use in a deposition system includes one or more baffles or equivalent structures within the source. The baffles provide for increased concentration of material entrained in a carrier gas that is passed through and emitted by the source.
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