Invention Grant
- Patent Title: Plasma pretreatment on current collectors for thin film lithium metallization
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Application No.: US15886396Application Date: 2018-02-01
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Publication No.: US11196045B2Publication Date: 2021-12-07
- Inventor: Gayatri V. Dadheech , Li Yang , Mark W. Verbrugge
- Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Applicant Address: US MI Detroit
- Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Current Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Current Assignee Address: US MI Detroit
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01M4/38
- IPC: H01M4/38 ; H01M4/04 ; H01M4/66 ; H01M10/0525 ; H01M4/139 ; H01M4/02

Abstract:
Methods of forming a lithium-based negative electrode assembly are provided. A surface of a metal current collector is treated with a reducing plasma gas so that after the treating, a treated surface of the metal current collector is formed that has a contact angle of less than or equal to about 10° and has less than or equal to about 5% metal oxides. The metal current collector may include a metal, such as copper, nickel, and iron. A lithium metal is applied to the treated surface of the metal current collector in an environment substantially free from oxidizing species. Lithium metal flows over and adheres to the treated surface to form a layer of lithium. The layer of lithium may be a thin layer having a thickness of ≥about 1 μm to ≤about 75 μm thus forming the lithium metal negative electrode assembly.
Public/Granted literature
- US20190237758A1 PLASMA PRETREATMENT ON CURRENT COLLECTORS FOR THIN FILM LITHIUM METALLIZATION Public/Granted day:2019-08-01
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