Invention Grant
- Patent Title: Modulation doped semiconductor laser and manufacturing method therefor
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Application No.: US16845235Application Date: 2020-04-10
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Publication No.: US11196232B2Publication Date: 2021-12-07
- Inventor: Takayuki Nakajima , Atsushi Nakamura , Yuji Sekino
- Applicant: Lumentum Japan, Inc.
- Applicant Address: JP Kanagawa
- Assignee: Lumentum Japan, Inc.
- Current Assignee: Lumentum Japan, Inc.
- Current Assignee Address: JP Kanagawa
- Agency: Harrity & Harrity, LLP
- Priority: JPJP2019-150057 20190819,JPJP2019-189348 20191016
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S5/30 ; H01S5/34 ; H01S5/343 ; H01S5/12

Abstract:
A modulation doped semiconductor laser includes a multiple quantum well composed of a plurality of layers including a plurality of first layers and a plurality of second layers stacked alternately and including an acceptor and a donor; a p-type semiconductor layer in contact with an uppermost layer of the plurality of layers; and an n-type semiconductor layer in contact with a lowermost layer of the plurality of layers, the plurality of first layers including the acceptor so that a p-type carrier concentration is 10% or more and 150% or less of the p-type semiconductor layer, the plurality of second layers containing the acceptor so that the p-type carrier concentration is 10% or more and 150% or less of the p-type semiconductor layer, the plurality of second layers containing the donor, and an effective carrier concentration corresponding to a difference between the p-type carrier concentration and an n-type carrier concentration is 10% or less of the p-type carrier concentration of the plurality of second layers.
Public/Granted literature
- US20210057886A1 MODULATION DOPED SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREFOR Public/Granted day:2021-02-25
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